Liquid crystal display and panel therefor

ABSTRACT

A flat panel display having an improved picture quality is disclosed. In one embodiment, a first pixel electrode and a second pixel electrode are formed in each subpixel area. The electrodes enclose an open space (gap) such that their outer boundary has a substantially rectangular shape. The flat panel display may also include a capacitance electrode coupled to the second pixel electrode to form a coupling capacitor. In use, the coupling capacitor operates such that a magnitude of a voltage applied to the first pixel electrode is lower than an applied data voltage, and a magnitude of a voltage applied to the second pixel electrode is higher than an applied voltage. The different voltages operate such that a tilt direction of LC molecules disposed above the first pixel electrode differs from a tilt direction of LC molecules disposed above the second pixel electrode.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.13/073,505 filed Mar. 28, 2011, which is a continuation of U.S. patentapplication Ser. No. 12/749,761 filed Mar. 30, 2010, which is acontinuation of U.S. patent application Ser. No. 11/682,995 filed onMar. 7, 2007, which is a continuation of U.S. patent application Ser.No. 10/916,518, filed Aug. 12, 2004, now U.S. Pat. No. 7,206,048 whichclaims priority to Korean Application 2003-0056067, filed Aug. 13, 2003and to Korean Application 2003-0056546, filed Aug. 14, 2003, thedisclosures of which are incorporated by reference herein in theirentirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to liquid crystal displays generally, andmore particularly, to an improved thin film transistor (TFT) paneltherefor.

2. Description of Related Art

A liquid crystal display (LCD) is one of the most widely used flat paneldisplays. A LCD includes two panels provided with field-generatingelectrodes such as pixel electrodes and a common electrode and a liquidcrystal (LC) layer interposed therebetween. The LCD displays images byapplying voltages to the field-generating electrodes to generate anelectric field in the LC layer, which determines orientations of LCmolecules in the LC layer to adjust polarization of incident light.

An example of a LCD is a vertical alignment (VA) mode LCD, which alignsLC molecules such that the long axes of the LC molecules areperpendicular to the panels in the absence of electric field. VA modeLCD's are popular due to their high contrast ratio and wide referenceviewing angle. A wide reference viewing angle is either (i) a viewingangle that makes the contrast ratio equal to 1:10 or (ii) a limit anglefor the inversion in luminance between grays.

The wide viewing angle of the VA mode LCD can be provided either bycutouts in the field-generating electrodes or by protrusions on thefield-generating electrodes. Since the cutouts and the protrusions candetermine the tilt directions of the LC molecules, the tilt directionscan be distributed into several directions by using the cutouts and theprotrusions such that the reference viewing angle is widened.

Although the reference viewing angle can be widened in VA mode LCDs,such LCDs suffer several disadvantages. For example, the quality oflateral visibility is poor as compared with front visibility. Forexample, in a patterned VA (PVA) mode LCD having cutouts, an imagebecomes bright as a viewer goes far from the front. In serious cases,the luminance difference between high grays vanishes such that theimages cannot be perceived.

Additionally, VA mode LCDs often have poor response times. For example,although the LC molecules near the cutouts or protrusions rapidly tiltin a direction in response to a strong fringe field, the LC moleculesfar from the cutouts or protrusions may experience a weak fringe fieldand may not rapidly determine the tilt directions. Accordingly, the LCmolecules far from the cutouts or protrusions are pushed or collided byadjacent molecules to be tilted. Narrowing the distance between thecutouts may improve response times, but it may also reduce the apertureratio.

SUMMARY OF THE INVENTION

The invention is directed to a flat panel display having an improvedpicture quality. In one embodiment the flat panel display includes acommon electrode formed of a transparent conductive material and havingat least one cutout therein. One or more pixel areas are positionedunder the common electrode, and each pixel area includes one or moresubpixel areas. A liquid crystal (LC) layer is disposed between thecommon electrode and the one or more subpixel areas, and the LC layerincludes a plurality of LC molecules.

In each subpixel area, a first pixel electrode and a second pixelelectrode are formed that engage with each other and enclose an openspace (gap) such that their outer boundary has a substantiallyrectangular shape. The first pixel electrode includes a pair ofright-angled triangular shaped portions facing one or more oblique edgesof the second pixel electrode and also includes a longitudinal portionfacing a side edge of the second pixel electrode. The second pixelelectrode has a shape that approximates an equilateral trapezoid. Thesecond electrode may also have an edge thereof disposed proximate afirst storage electrode and another edge disposed proximate a secondstorage electrode. The gap formed between the first and secondelectrodes is disposed between the at least one cutout formed in thecommon electrode and an opening that separates a pixel area from anotherof the one or more pixel areas.

The flat panel display may also include a capacitance electrode coupledto the second pixel electrode to form a coupling capacitor. In use, thecoupling capacitor operates such that a magnitude of a voltage appliedto the first pixel electrode is lower than an applied data voltage, anda magnitude of a voltage applied to the second pixel electrode is higherthan an applied voltage. The different voltages operate such that a tiltdirection of LC molecules disposed above the first pixel electrodediffers from a-tilt direction of LC molecules disposed above the secondpixel electrode.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a top view of a TFT array panel of a LCD according to anembodiment of the present invention.

FIG. 2 is a top view of a common electrode panel of a LCD according toan embodiment of the present invention.

FIG. 3 is a top view of a LCD including the TFT array panel shown inFIG. 1 and the common electrode panel shown in FIG. 2.

FIGS. 4 and 5 are sectional views of the LCD shown in FIG. 3 taken alongthe lines IV-IV′ and V-V′, respectively.

FIG. 6 is a schematic equivalent circuit diagram of the TFT array panelshown in FIGS. 1-5.

FIG. 7 illustrates time variation of several voltages in the LCD ofFIGS. 1-6.

FIG. 8 is a graph illustrating the voltages of the first and the secondpixel electrodes of a LCD as function of a data voltage obtained bysimulation, according to an embodiment of the present invention.

FIGS. 9 and 10 are graphs illustrating visibility distortion as functionof an area occupied by the second pixel electrode (PE) and as a functionof a voltage ratio of the second pixel electrode to the first pixelelectrode in a LCD, which functions were obtained by simulation,according to an embodiment of the present invention.

FIGS. 11A-11C are graphs illustrating front and lateral gamma curves foran undivided pixel, a bisected pixel including two subpixels havingdifferent voltages, and a trisected pixel including three subpixelshaving different voltages.

FIG. 12 is an equivalent circuit diagram of a TFT array panel includinga trisected pixel of a LCD, according to an embodiment of the presentinvention;

FIG. 13 is a top view of a TFT array panel for a LCD, according toanother embodiment of the present invention.

FIGS. 14 and 15 are sectional views of the TFT array panel shown in FIG.13 taken along the lines XIV-XIV′ and XV-XV′, respectively.

FIG. 16 is a top view of a TFT array panel for a LCD, according toanother embodiment of the present invention.

FIG. 17 is a top view of a common electrode panel for a LCD, accordingto another embodiment of the present invention.

FIG. 18 is a top view of a LCD including the TFT array panel shown inFIG. 16 and the common electrode panel shown in FIG. 17.

FIGS. 19-21 are sectional views of the LCD shown in FIG. 18 taken alongthe lines XIX-XIX′, XX-XX′, and XXI-XXI′, respectively.

FIG. 22 is a top view of a TFT array panel for a LCD, according toanother embodiment of the present invention.

FIGS. 23 and 24 are sectional views of the TFT array panel shown in FIG.22 taken along the lines XXIII-XXIII′ and XXIV-XXIV′, respectively.

DETAILED DESCRIPTION OF EMBODIMENTS

The present invention is described more fully hereinafter with referenceto the accompanying drawings, in which preferred embodiments of theinvention are shown. The present invention may, however, be embodied inmany different forms and should not be construed as limited to theembodiments set forth herein.

In the drawings, the thickness of layers, films and regions areexaggerated for clarity. Like numerals refer to like elementsthroughout. It will be understood that when an element such as a layer,film, region or substrate is referred to as being “on” another element,it can be directly on the other element or intervening elements may alsobe present. In contrast, when an element is referred to as being“directly on” another element, there are no intervening elementspresent.

A LCD according to an embodiment of the present invention is describedin detail with reference to FIGS. 1-6. FIG. 1 is a top view of a TFTarray panel of a LCD according to an embodiment of the presentinvention. FIG. 2 is a top view of a common electrode panel of a LCDaccording to an embodiment of the present invention. FIG. 3 is a topview of a LCD including the TFT array panel shown in FIG. 1 and thecommon electrode panel shown in FIG. 2. FIGS. 4 and 5 are sectionalviews of the LCD shown in FIG. 3 taken along the lines IV-IV′ and V-V′,respectively.

Referring to FIG. 1, a LCD according to an embodiment of the presentinvention includes a TFT array panel 100, a common electrode panel 200,and a LC layer 3 interposed between the panels 100 and 200 andcontaining a plurality of LC molecules aligned substantially vertical tosurfaces of the panels 100 and 200.

FIGS. 1 and 3-5 illustrate one embodiment of a TFT array panel 100according to the invention. As shown, a plurality of gate lines 121 anda plurality of storage electrode lines 131 are formed on an insulatingsubstrate 110 such as transparent glass.

The gate lines 121 are configured to transmit gate signals and extend ina substantially transverse direction. Additionally the gate lines 121are separated from each other. Each gate line 121 includes a pluralityof first electrodes 124 a protruding downward and second gate electrodes124 c protruding upward. The gate lines 121 may extend to be connectedto a driving circuit (not shown) integrated on the substrate 110.Alternatively, one or more of the plurality of gate lines may have anend portion (not shown) having a large area for connection with (i)another layer, or (ii) an external driving circuit, which may be mountedon the substrate 110 or mounted on another device, such as a flexibleprinted circuit film (not shown), that may be attached to the substrate110.

Each storage electrode line 131 also extends in the substantiallytransverse direction and is substantially equidistant from adjacent gatelines 121. Each storage electrode line 131 includes a plurality of pairsof branches forming storage electrodes 133 a and 133 b. Each branch pairincludes a first storage electrode 133 a and a second storage electrode133 b, both of them are extending upward and downward. Illustratively,the first storage electrode 133 a is much longer than the second storageelectrode 133 b such that both ends of the first storage electrode 133 aare disposed close to the gate lines 121, while both ends of the secondstorage electrode 133 b are disposed approximately at midpoint betweenthe gate lines 121 and the storage electrode line 131. The secondstorage electrode 133 b has an expansion 136 at its lower end. Thestorage electrode lines 131 are supplied with a predetermined voltagesuch as a common voltage, which is applied to a common electrode 270 onthe common electrode panel 200 of the LCD. Each storage electrode line131 may include two stems extending in the transverse direction andpositioned close to the gate lines 121.

In one embodiment, the gate lines 121 and the storage electrode lines131 are each preferably made of (i) an Al containing metal (such as Alor an Al alloy), (ii) a Ag containing metal (such as Ag or a Ag alloy),(iii) a Cu containing metal (such as Cu or a Cu alloy), (iv) a Mocontaining metal (such as Mo and Mo alloy). Additionally, each of thegate lines 121 and the storage electrode lines 131 may be formed ofmaterials such as, but not limited to, Cr, Ti or Ta.

The gate lines 121 and the storage electrode lines 131 may have amulti-layered structure that includes two films, a lower film (notshown) and an upper film (not shown), having different physicalcharacteristics. In an exemplary embodiment, the upper film ispreferably made of a low resistivity metal, such as, but not limited to,an Al containing metal such as Al or an Al alloy. A low resistivitymetal is used in the upper layer to reduce signal delay or voltage dropin the gate lines 121 and the storage electrode lines 131. On the otherhand, the lower film may be preferably made of material such as Cr, Mo,or a Mo alloy, which has good contact characteristics with othermaterials such as, but not limited to, indium tin oxide (ITO) or indiumzinc oxide (IZO). In other embodiments, the gate lines 121 and thestorage electrode lines 131 may be made of other various metals orconductive materials.

In some embodiments, the lateral sides of the gate lines 121 and thestorage electrode lines 131 may be inclined at an inclination angle inthe range of about 30-80 degrees, relative to a surface of thesubstrate.

Additionally, a gate insulating layer 140 preferably made of siliconnitride (SiNx) may be formed on the gate lines 121 and the storageelectrode lines 131.

A plurality of semiconductor strips 151 preferably made of hydrogenatedamorphous silicon (abbreviated to “a-Si”) or polysilicon are then formedon the gate insulating layer 140. As illustratively shown, eachsemiconductor strip 151 may extend substantially in the longitudinaldirection and have a plurality of projections 154 a and 154 c branchedout toward the first and the second gate electrodes 124 a and 124 c.

In one embodiment, a plurality of ohmic contact strips 161 and ohmiccontact islands 163 c and 165 a-165 c, which may be made of silicide orn+ hydrogenated a-Si heavily doped with n type impurity such asphosphorous, are formed on the semiconductor strips 151. Each ohmiccontact strip 161 has a plurality of projections 163 a, and theprojections 163 a and the ohmic contact islands 165 a and 165 b arelocated in sets on the projections 154 a of the semiconductor strips151. The ohmic contact islands 163 c and 165 c may be located in pairson the projections 154 c of the semiconductor strips 151.

Additionally, in one embodiment, the lateral sides of the semiconductorstrips 151 and the ohmic contacts 161 and 165 are inclined at aninclination angles in a range about 30-80 degrees relative to a surfaceof the substrate.

In the embodiment shown in FIG. 5, a plurality of data lines 171 areformed on a corresponding plurality of ohmic contacts 161. As shown inFIG. 4, a plurality of first source electrodes 173 a are formed on acorresponding plurality of ohmic contacts 163 a. Additionally, aplurality of first drain electrodes 175 a and second drain electrodes175 b are fainted on corresponding pluralities of ohmic contacts 165 aand 165 b, respectively. Referring again to FIG. 5, a plurality ofsecond source electrodes 173 c are formed on the ohmic contacts 163 c,and a plurality of third drain electrodes 175 c are formed on the ohmiccontacts 165 c.

Referring back to FIG. 1, the data lines 171 for transmitting datavoltages may extend in a substantially longitudinal direction tointersect the gate lines 121 and the storage electrode lines 131. Eachdata line 171 is disposed between adjacent branch sets 133 a and 133 band includes an end portion 179 having a large area for contact withanother layer or an external device.

As shown in FIG. 1, each data line 171 may include a plurality ofbranches that project toward the first and the second drain electrodes175 a and 175 b. These branches form the first source electrodes 173 a,which are disposed on the ohmic contacts 163 a.

The first drain electrodes 175 a have one end portion respectivelydisposed on the ohmic contact 165 a opposite the first gate electrodes124 a. Additionally, the second drain electrodes 175 b have one endportion respectively disposed on the ohmic contact 165 b opposite thefirst gate electrodes 124 a. Both pluralities of drain electrodes 175 aand 175 b extend downward and substantially parallel to each other andhave other end portions expanded for contact with another layer. Asillustratively shown, the length of the second drain electrodes 175 bmay be longer than that of the first drain electrodes 175 a such thatthe expanded end portions of the second drain electrodes 175 b arelocated near the ends of the second storage electrodes 133 b. Each ofthe first source electrodes 173 a may be twice curved such that the twocurved portions partly enclose the end portions of the first and thesecond drain electrodes 175 a and 175 b, respectively.

Referring to the bottom area of FIG. 1, the second source electrodes 173c have one end disposed on ohmic contacts 163 opposite the second gateelectrodes 124. The third drain electrodes 175 c have one end disposedon the ohmic contacts 165 c opposite the second gate electrodes 124 c.Both the second source electrodes 173 c and the third drain electrodes175 c extend upward and substantially parallel to each other. Each ofthe second source electrodes 173 c has another end portion expanded forcontact with another layer, and each of the third drain electrodes 175 chas an expanded end portion 176 called a coupling electrode overlappingthe expansion connector 136 of a storage electrode 133 b.

Referring to a top portion of FIG. 1, a first TFT “Q1” is formed byfirst gate electrode 124 a, a first source electrode 173 a, along with aprojection 154 a of a semiconductor strip 151. A second TFT “Q2” isformed by a first gate electrode 124 a, a first drain electrode 175,along with a projection 154 a of a semiconductor strip 151. A channel isformed in a portion of the projection 154 a that is disposed between thefirst source electrode 173 a and the first/second drain electrodes 175a/175 b. Similarly, referring to a bottom portion of FIG. 1, a secondgate electrode 124 c, a second source electrode 173 c, and a third drainelectrode 175 c along with a projection 154 c of the semiconductor strip151 form a third TFT Q3 having a channel formed in a portion of theprojection 154 c disposed between the second source electrode 173 c andthe third drain electrode 175 c.

The data lines 171, the second source electrodes 173 c, and the drainelectrodes 175 a-175 c are preferably made of refractory metal such as,but not limited to, Cr, a Mo containing metal, Ti, a Ti containingmetal, or an Al containing metal. Each of these elements may have amultilayered structure including a lower film (not shown) preferablymade of refractory metal and an upper film (not shown) located thereonand preferably made of low resistivity material.

Like the gate lines 121 and the storage electrode lines 131, the datalines 171, the second source electrodes 173 c, and the drain electrodes175 a-175 c may have tapered lateral sides, and inclination angles inthe range of about 30-80 degrees.

The ohmic contacts 161, 163 a and 165 a-165 c are interposed onlybetween (i) the underlying semiconductor strips 151 and the overlyingdata lines 171, and (ii) between the second source electrodes 173 c andthe overlying drain electrodes 175 a-175 c thereon to reduce the contactresistance therebetween. The semiconductor strips 151 may include aplurality of exposed portions, which are not covered with the data lines171, the second source electrodes 173 c, or the drain electrodes 175a-175 c. Illustratively, such exposed portions may be located betweenthe source electrodes 173 a and 173 c and the drain electrodes 175 a-175c.

Referring to FIG. 4, a passivation layer 180 may be formed on the datalines 171, the second source electrodes 173 c, and the drain electrodes175 a-175 c, and the exposed portions of the semiconductor strips 151.In one embodiment, the passivation layer 180 is preferably made ofphotosensitive organic material having good flatness characteristics.Illustratively, such a material may include a low dielectric insulatingmaterial having a dielectric constant lower than about 4.0, such as, butnot limited to, a-Si:C:O and a-Si:O:F. Such materials may be formed byplasma enhanced chemical vapor deposition (PECVD). Alternatively, thematerial may include an inorganic material such as silicon nitride. Thepassivation layer 180 may include a lower film formed of an inorganicinsulator and an upper film formed of an organic insulator.

As shown in FIG. 5, the passivation layer 180 has a plurality of contactholes 182, 183 c, 185 a and 185 b exposing the end portions 179 of thedata lines 171, the expanded end portions of the second sourceelectrodes 173 c, and the expanded end portions of the first and thesecond drain electrodes 175 a and 175 b, respectively.

In one embodiment, a plurality of pairs of first and second pixelelectrodes 190 a and 190 b and a plurality of contact assistants 82,which are preferably made of a transparent conductor such as ITO and IZOor a reflective conductor such as Al, are formed on the passivationlayer 180.

The first/second pixel electrodes 190 a/190 b are physically andelectrically connected to the first/second drain electrodes 175 a/175 bthrough the contact holes 185 a/185 b such that the first/second pixelelectrodes 190 a/190 b receive the data voltages from the first/seconddrain electrodes 175 a/175 b. In addition, the first pixel electrodes190 a are connected to the second source electrodes 173 c through thecontact holes 173 c, and the second pixel electrodes 190 b overlap thecoupling electrodes 176 connected to the third drain electrode 175 c.

When supplied with data voltages, the pixel electrodes 190 a and 190 bgenerate electric fields in cooperation with the common electrode 270,which reorient liquid crystal molecules in the liquid crystal layer 3.

A pixel electrode 190 a/190 b and the common electrode 270 form a liquidcrystal capacitor, which stores applied voltages after the TFT turnsoff. An additional capacitor called a “storage capacitor,” which isconnected in parallel to the liquid crystal capacitor, is provided forenhancing the voltage storing capacity. The storage capacitors areimplemented by overlapping the pixel electrodes 190 a and 190 b with thestorage electrode lines 131 and the storage electrodes 133 a and 133 b.

Referring to FIGS. 1 and 3, a pair of first and second pixel electrodes190 a and 190 b engage with each other and enclose an open space(hereinafter, “gap”) such that their outer boundary has a substantiallyrectangular shape. In one embodiment, the second pixel electrode 190 bmay be shaped like a rotated equilateral trapezoid. The second pixelelectrode may have a left edge thereof disposed near a first storageelectrode 133 a, a right edge disposed near a second storage electrode133 b, and a pair of upper and lower oblique edges, each making an angleof about 45 degrees with the gate lines 121.

The first pixel electrode 190 a may include a pair of right-angledtriangular portions facing the oblique edges of the second pixelelectrode 190 b and a longitudinal portion facing the left edge of thesecond pixel electrode 190 b. Accordingly, a gap between the first pixelelectrode 190 a and the second pixel electrode 190 b may include a pairof oblique lower and upper portions 191 and 193, each having asubstantially uniform width and making an angle of about 45 degrees withthe gate lines 121. The gap may also include a longitudinal portionhaving a substantially uniform width. As shown, the oblique portions 191and 193 are longer than the longitudinal portion.

As shown in FIG. 1, the second pixel electrode 190 b may have a cutout192 extending along the storage electrode line 131 to bisect the secondpixel electrode 190 into lower and upper partitions. The cutout 192 mayhave an inlet from the right edge of the second pixel electrode 190 b.Additionally, the inlet of the cutout 192 may have a pair of inclinededges substantially parallel to the lower oblique portion 191 and theupper oblique portion 193 of the gap, respectively. The gaps 191 and 193and the cutout 192 substantially have inversion symmetry with respect tothe storage electrode line 131.

The number of partitions or the number of the cutouts may vary dependingon design factors such as the size of pixels, the ratio of thetransverse edges and the longitudinal edges of the first and secondpixel electrodes 190 a and 190 b, the type and characteristics of theliquid crystal layer 3, and so on. For descriptive convenience, the gaps191 and 193 may sometimes be referred to as cutouts. Thus, in oneembodiment, the storage electrode lines 131 may further include aplurality of branches (not shown) overlapping the cutouts 191-193.

As illustratively shown in FIG. 1, the contact assistants 82 may beconnected to the end portions 179 of the data lines 171 through thecontact holes 182. The contact assistants 82 protect the end portions179 and complement the adhesion between the end portions 179 andexternal devices.

The description of the common electrode panel 200 follows with referenceto FIGS. 2-5.

Referring to FIGS. 4 and 5, a light blocking member 220 called a blackmatrix for preventing light leakage is formed on an insulating substrate210 such as transparent glass. The light blocking member 220 may includea plurality of openings that face the pixel electrodes 190 and it mayhave substantially the same shape as the pixel electrodes 190. However,the light blocking member 220 may have a variety of shapes for blockinglight leakage near the pixel electrodes 190 a and 190 b and the TFTsQ1-Q3, shown in FIG. 1.

A plurality of color filters 230 may be formed on the substrate 210 anddisposed substantially in the areas enclosed by the light blockingmember 220. The color filters 230 may extend substantially along thelongitudinal direction along the pixel electrodes 190. The color filters230 may represent one of the primary colors such as red, green and bluecolors.

An overcoat 250 for preventing the color filters 230 from being exposedand for providing a flat surface may be formed on the color filters 230and the light blocking member 220.

A common electrode 270, preferably made of transparent conductivematerial such as ITO or IZO, may be formed on the overcoat 250, and mayinclude a plurality of sets of cutouts 271-273, as illustratively shownin FIGS. 2 and 4.

Referring to FIG. 2, set of cutouts 271-273 face a pixel electrode 190and include a lower cutout 271, a center cutout 272, and an upper cutout273. Each of the cutouts 271-273 is disposed between adjacent cutouts191-193 (FIG. 1) of the pixel electrode 190 or between a cutout 191 or193 and a chamfered edge of the pixel electrode 190. In addition, eachof the cutouts 271-273 has at least an oblique portion extendingparallel to the lower cutout 191 or the upper cutout 193 of the pixelelectrode 190, and the distances between adjacent two of the cutouts271-273 and 191-193, the oblique portions thereof, the oblique edgesthereof, and the chamfered edges of the pixel electrode 190, which areparallel to each other, are substantially the same. The cutouts 271-273substantially have inversion symmetry with respect to a third storageelectrode 133 c.

As shown in FIG. 2, each of the lower and upper cutouts 271 and 273 mayinclude an oblique portion extending approximately from a left edge ofthe pixel electrode 190 approximately to a lower or upper edge of thepixel electrode 190, and transverse and longitudinal portions extendingfrom respective ends of the oblique portion along edges of the pixelelectrode 190, to overlap the edges of the pixel electrode 190, and makeobtuse angles with the oblique portion.

In one embodiment, the center cutout 272 may also include a centraltransverse portion extending approximately from the left edge of thepixel electrode 190 along the third storage electrode 133 c, a pair ofoblique portions extending from an end of the central transverse portionapproximately to a right edge of the pixel electrode and making obtuseangles with the central transverse portion, and a pair of terminallongitudinal portions extending from the ends of the respective obliqueportions along the right edge of the pixel electrode 190. The pair oflongitudinal portions may overlap the right edge of the pixel electrode190, and make obtuse angles with the respective oblique portions.

The number of the cutouts 271-273 may vary depending on design factors.Similarly, in one embodiment, the light blocking member 220 may alsooverlap the cutouts 271-273 to block the light leakage through thecutouts 271-273.

Referring to FIGS. 4 and 5, alignment layers 11 and 21 for aligning theLC molecules may be coated on inner surfaces of the panels 100 and 200.Crossed polarizers 12 and 22 are provided on outer surfaces of thepanels 100 and 200, respectively, such that a transmissive axis of oneof the polarizers 12 and 22 is parallel to the transverse direction. Theterm “crossed” includes a configuration here a transmissive axis of onepolarizer is opposite a transmissive axis of the other polarizer. One ofthe polarizers may be omitted when the LCD is a reflective LCD.

In one embodiment, the LC layer 3 has negative dielectric anisotropy,and the LC molecules in the LC layer 3 are aligned such that their longaxes are substantially vertical to the surfaces of the panels in absenceof electric field.

As mentioned above, a set of the cutouts 191-193 and 271-273 divides apair of first and second pixel electrodes 190 a and 190 b into aplurality of subareas. As shown in FIG. 3, each subarea has two majoredges. The cutouts 191-193 and 271-273 control the tilt directions ofthe LC molecules in the LC layer 3, which is further described below.Additionally, the cutouts 191-193 and 271-273 of the electrodes 190 a,190 b and 270 distort the electric fields to have a horizontalcomponent. The horizontal components of the electric fields areperpendicular to the edges of the cutouts 191-193 and 271-273.Accordingly, the tilt directions of the LC molecules on the subareas aredifferent and thus the reference viewing angle is enlarged.

At least one of the cutouts 191-193 and 271-273 can be substituted withprotrusions or depressions, and the shapes and the arrangements of thecutouts 191-193 and 271-273 may be modified.

Furthermore, and the shape and the position of the coupling electrode176 may be modified.

FIG. 6 depicts the TFT array panel 100 of FIGS. 1-5 as a schematicequivalent circuit. As shown in FIG. 6, the TFT array panel 100 includesa plurality of gate lines, a plurality of data lines, and a plurality ofpixels. Each pixel includes a pair of first and second pixel electrodes190 a and 190 b, first, second, and third TFTs Q1-Q3, and a couplingelectrode 176. As previously described the first/second TFT Q1/Q2 isconnected to a gate line, a data line supplied with data voltages, andthe first/second pixel electrode 190 a/190 b. The third TFT Q3 isconnected to a gate line adjacent the gate line that is connected to thefirst and the second TFTs Q1 and Q2. The third TFT Q3 is also connectedto the first pixel electrode 190 a and the coupling electrode 176. Thecoupling capacitor electrode 176 is capacitively coupled to the secondpixel electrode 190 b to form a coupling capacitor Cbc.

Now, an illustrative behavior of one embodiment of a pixel is describedin detail.

When the gate line connected to the first and the second TFTs Q1 and Q2is supplied with a gate-on voltage, the first and the second TFT Q1 andQ2 turn on to transmit a data voltage to the first and the second pixelelectrodes 190 a and 190 b. At this time, the coupling electrode 176that is capacitively coupled to the second pixel electrode 190 b and hasa voltage charged in a previous frame may change its voltage. When thegate line is supplied with a gate-off voltage, the first and the secondpixel electrodes 190 a and 190 b become floating. When the adjacent gateline connected to the third TFT Q3 is supplied with the gate-on voltage,the third TFT Q3 turns on to electrically connect the first pixelelectrode 190 a and the coupling electrode 176 such that the first pixelelectrode 190 a and the coupling electrode 176 have an equal voltage.The capacitive coupling between the coupling electrode 176 and thesecond pixel electrode 190 b also changes the voltage of the secondpixel electrode 190 b. As a result, the magnitude of the voltage of thefirst pixel electrode 190 a with respect to the common voltage becomeslower than the initial data voltage, while the magnitude of the voltageof the second pixel electrode 190 b with respect to the common voltagebecomes higher than the initial data voltage. In this manner, the firstand the second pixel electrodes 190 a and 190 b have different voltages,which reduces the distortion of gamma curves and improves picturequality. These improvements are described in more detail with referenceto FIG. 7.

FIG. 7 illustrates time variation of several voltages in the LCD ofFIGS. 1-6. In FIG. 7, the characters “A” and “B” represent the voltagesof first and second pixel electrodes 190 a and 190 b, respectively. Thecharacter “C” represents the voltage of a coupling electrode 176. Thecharacters “D” and “E” represent gate signals applied to a gate line 121and a next gate line 121, respectively. And, the character “F”represents data voltages applied to a data line 171. The character Vcomindicates the voltage of the common electrode 270.

As shown in FIG. 7, five voltage changes were observed for each ofsubsequent two frames, i.e., the n-th and the (n+1)-th frames.

In one experiment, at the time the gate line connected to the first andthe second TFTs Q1 and Q2 was supplied with a gate-on voltage to turn onthe first and the second TFTs Q1 and Q2, the voltages A, B and C of thefirst and the second pixel electrodes 190 a and 190 b and the couplingelectrode 176 were slightly changed due to the kickback caused by theparasitic capacitances between the drain electrodes 175 a and 175 b andthe gate electrode 124 a of the first and the second TFTs Q1 and Q2.

After the first and the second TFTs Q1 and Q2 turned on to transmit thedata voltage F having negative polarity with respect to the commonvoltage Vcom, the voltages A and B of the first and the second pixelelectrodes 190 a and 190 b were changed to have the same value with thedata voltage F. At this time, the voltage C of the coupling electrode176 was also changed by the capacitive coupling with the second pixelelectrode 190 b. However, the change in the voltage C was smaller thanthe change in the voltages A and B of the first and the second pixelelectrodes 190 a and 190 b such that the voltage C with respect to thecommon voltage Vcom was smaller than the voltages A and B with respectto the common voltage Vcom.

At the time that the gate line was supplied with a gate-off voltage toturn off the first and the second TFTs Q1 and Q2, the voltages A, B andC of the first and the second pixel electrodes 190 a and 190 b and thecoupling electrode 176 were slightly varied again due to the kickback.

At the time that the next gate line connected to the third TFT Q3 wassupplied with the gate-on voltage to turn on the third TFT Q3, thevoltages A, B and C of the first and the second pixel electrodes 190 aand 190 b and the coupling electrode 176 were slightly varied due to thekickback caused by the parasitic capacitances between the drainelectrode 175 c and the gate electrode 124 b of the third TFT Q3.

After the third TFT Q3 turned on to electrically connect the first pixelelectrode 190 a and the coupling electrode 176, the voltages A and C ofthe first pixel electrode 190 a and the coupling electrode 176 becameequal to each other and the voltage B of the second pixel electrode 190b was also changed. In detail, the voltage A of the first pixelelectrode 190 a became increased, while the voltage B of the secondpixel electrode 190 b became decreased. In terms of absolute values ofthe voltages A and B subtracted by the common voltage Vcom, the voltageA of the first pixel electrode 190 a was decreased, while the voltage Bof the first pixel electrode 190 b was increased. In other words,.vertline.A-Vcom.vertline. was decreased from .vertline.F-Vcom.vertline.and .vertline.B-Vcom.vertli-ne. was increased from.vertline.F-Vcom.vertline. .

At the time that the next gate line was supplied with the gate-offvoltage to turn off the third TFT Q3, the voltages A, B and C of thefirst and the second pixel electrodes 190 a and 190 b and the couplingelectrode 176 were slightly varied again due to the kickback. However,.vertline.A-Vcom.vertline. was still smaller than.vertline.F-Vcom.vertli-ne. and .vertline.B-Vcom.vertline. was stilllarger than .vertline.F-Vcom.vertline.

In one embodiment, the magnitude of the voltage difference between thefirst and the second pixel electrodes 190 a and 190 b may be determinedby several capacitances. For example, by the capacitance of the couplingcapacitor Cbc (hereinafter referred to as “coupling capacitance” andalso denoted by reference designator “Cbc”) and the storage capacitance(hereinafter, denoted by “Cstc”) between the coupling electrode 176 andthe expansion 136 of the second storage electrode 133 b. In oneembodiment, the storage capacitance Cstc between the coupling electrode176 and the expansion 136 of the second storage electrode 133 bpreferably ranges about 1/10-⅓ of the storage capacitance (hereinafter,denoted by “Csta”) between the first pixel electrode 190 a and thestorage electrode lines 131. In addition, the coupling capacitance Cbcis preferably similar to the storage capacitance Cstc. In one particularembodiment, one of the capacitances Cbc and Cstc is preferably about twotimes smaller than the other of the capacitances Cbc and Cstc.

Additionally, in one embodiment, it is preferable that the couplingelectrode 176 be fully covered with the second pixel electrode 190 bsuch that the capacitance between the coupling electrode 176 and thecommon electrode 270 substantially vanishes. The simultaneousoverlapping of the coupling electrode 176, the second pixel electrode190 b, and the storage expansion 136 yields a maximum aperture ratio.However, in other embodiments, the storage expansion connector 136 neednot overlap the coupling electrode 176, and the arrangement and theshape of the storage electrode line 131 and the coupling electrode 176may have various modifications.

Furthermore, in another embodiment, it is preferable that the parasiticcapacitance (denoted by “Cgda” hereinafter) between the first drainelectrode 175 a and the first gate electrode 124 a have a magnitudesimilar to the parasitic capacitance (denoted by “Cod” hereinafter)between the second drain electrode 175 b and the first gate electrode124 a. Additionally, the parasitic capacitance (denoted by “Cgdc”hereinafter) between the third drain electrode 175 c and the second gateelectrode 124 b may be larger than the parasitic capacitance Cod.

Next, a relation between the voltages of the first and the second pixelelectrodes 190 a and 190 b and the data voltage is described in detailwith reference to FIG. 8.

FIG. 8 is a graph illustrating the voltages of the first and the secondpixel electrodes of a LCD as function of a data voltage obtained bysimulation, according to an embodiment of the present invention. Thecharacters A and B in the legend indicate the voltages of the first andthe second pixel electrodes 190 a and 190 b, respectively.

As shown in FIG. 8, when the data voltage is equal to 2V, the voltagedifference between the first and the second pixel electrodes 190 a and190 b is equal to about 0.59V. When the data voltage is equal to about5.0 V, the the voltage difference is equal to about 1.19V. Similarly,when the data voltage equal to 5V, the voltage drop of the first pixelelectrode 190 a is equal to about 0.55V, and the voltage raise of thesecond pixel electrode 190 b is equal to about 0.64V. In otherembodiments, the voltage drop and the voltage raise may be adjusted bychanging the capacitances or the area of the electrodes, as describedabove.

In one embodiment, under an optimal condition, the ratio of the area ofthe first pixel electrode 190 a to the area of the second pixelelectrode 190 b is preferably in a range from about 50:50 to about80:20, more preferably in a range from about 70:30 to about 80:20.Similarly the ratio of the voltage of the first pixel electrode 190 a tothe voltage of the second pixel electrode 190 b is in a range from about1:1.3 to about 1:1.5, which will be described in detail with referenceto FIGS. 9 and 10.

FIGS. 9 and 10 are graphs illustrating visibility distortion as functionof areal occupation of (e.g., area occupied by) the second pixelelectrode (PE) and voltage ratio of the second pixel electrode to thefirst pixel electrode in a LCD according to an embodiment of the presentinvention, respectively, which are obtained by simulations. The resultsshown were obtained for a viewing angle of 60 degrees at the right sideand at the diagonal side.

As shown in FIG. 9, the visibility is minimally distorted for an arealoccupation equal to about 20-30%. Accordingly, the ratio of the area ofthe first pixel electrode 190 a to the second pixel electrode 190 bpreferably ranges from about 80:20 to about 70:30.

As shown in FIG. 10, the visibility distortion shows a minimum for avoltage ratio in an illustrative range of about 1.3-1.5.

Now, a principle of compensation of the distortion of gamma curves byproviding two pixel electrodes having different voltages in a pixel isdescribed in detail with reference to FIGS. 11A-11C.

FIGS. 11A-11C are graphs illustrating front and lateral gamma curves foran undivided pixel, a bisected pixel including two subpixels havingdifferent voltages, and a trisected pixel including three subpixelshaving different voltages. The grays include first to 64th grays, andthe front gamma curve is illustrated by a solid line, while the lateralgamma curve is illustrated by a dotted line.

The lateral gamma curve shown in FIG. 11A is severely distorted abovethe front gamma curve. In particular, the luminance at lower graysabruptly varies to cause severe distortion of the lateral gamma curve.

FIG. 11B represents data gathered from a bisected pixel that includesfirst and second LC capacitors capacitively coupled by a TFT or acoupling electrode. The first and the second LC capacitors chargevoltages higher and lower than the data voltage subtracted by the commonelectrode, respectively. At lower grays, the second LC capacitorsubstantially maintains a black state and the first LC capacitorprimarily contributes to images, thereby decreasing the luminance of thepixel (which is denoted by “Subpixel 1”). However, at higher grays, thesecond LC capacitor also contributes to images to increase the luminanceof the pixel (which is denoted by “Subpixel 2”). Therefore, thedistortion of the lateral gamma curve is reduced as shown in FIG. 11B.

Similarly, the distortion of the lateral gamma curve for a trisectedpixel is much reduced as shown in FIG. 11C.

FIG. 12 is an equivalent circuit diagram of a TFT array panel includinga trisected pixel of a LCD according to an embodiment of the presentinvention. As depicted by FIG. 12, the TFT array panel includes aplurality of gate lines, a plurality of data lines, and a plurality ofpixels. Each pixel includes first, second, and third second pixelelectrodes 190 a-190 c, first, second, third, and fourth TFTs Q1-Q4, anda coupling electrode 176.

In one embodiment, the first/second/third TFTs Q1/Q2/Q3 are eachconnected to a gate line, a data line supplied with data voltages, andto each first/second/third pixel electrode 190 a/190 b/190 c,respectively. The fourth TFT Q4 is connected to a gate line adjacent thegate line connected to the first to the third TFTs Q1-Q3. The TFT Q4 isalso connected to the first pixel electrode 190 a and the couplingelectrode 176. The coupling capacitor electrode 176 is capacitivelycoupled to the second pixel electrode 190 b to form a coupling capacitorCbc.

In use, as described above with reference to FIG. 6, the magnitude ofthe voltage of the first pixel electrode 190 a with respect to thecommon voltage becomes lower than the initial data voltage, while themagnitude of the voltage of the second pixel electrode 190 b withrespect to the common voltage becomes higher than the initial datavoltage. However, the voltage of the third pixel remains approximatelyequal to the initial data voltage. Accordingly, the first to the thirdpixel electrodes 190 a-190 c have different voltages, thereby muchreducing the distortion of gamma curves.

A TFT array panel for a LCD according to another embodiment of thepresent invention will be described in detail with reference to FIGS.13-15.

FIG. 13 is a top view of a TFT array panel for a LCD according toanother embodiment of the present invention, and FIGS. 14 and 15 aresectional views of the TFT array panel shown in FIG. 13 taken along thelines XIV-XIV′ and XV-XV′, respectively.

A layered structure of the TFT array panel according to this embodimentis almost the same as those shown in FIGS. 1-5. Accordingly, gate lines121 include a plurality of first gate electrodes 124 a and second gateelectrodes 124 c. Storage electrode lines 131 include a plurality ofstorage electrodes 133 a, 133 b, and 133 c. All these components areformed on a substrate 110, as shown. Also included on the substrate 110are: gate insulating layer 140, a plurality of semiconductor strips 151(including a plurality of projections 154 a and 154 c), and a pluralityof ohmic contact strips 161 (including a plurality of projections 163a), and a plurality of ohmic contact islands 163 c, and 165 a-165 c. Aplurality of data lines 171 including a plurality of first sourceelectrodes 173 a, a plurality of second source electrodes 173 c, and aplurality of first to third drain electrodes 175 a, 175 b, and 175 cincluding coupling electrodes 176 are formed on the ohmic contacts 161,163 c and 165 a-165 c, respectively. A passivation layer 180 is formedover the data lines 171. A plurality of contact holes 182, 183 c, 185 aand 185 b are provided at the passivation layer 180 and the gateinsulating layer 140. Additionally, a plurality of pairs of pixelelectrodes 190 a and 190 b, and a plurality of contact assistants 82 areformed on the passivation layer 180.

Different from the TFT array panel shown in FIGS. 1-5, the semiconductorstrips 151 have almost the same planar shapes as the data lines 171, thesource electrodes 173 a and 173 c, and the drain electrodes 175 a-175 cas well as the underlying ohmic contacts 161, 163 c and 165 a-165 c.However, the projections 154 a and 154 c of the semiconductor strips 151include some exposed portions, which are not covered with the data lines171, etc., such as portions located between the source electrodes 173 aand 173 c and the drain electrodes 175 a-175 c.

Furthermore, each gate line 121 has an expanded end portion 129 having alarge area for contact with another layer or an external device.Additionally, each gate insulating layer 140 and the passivation layer180 have a plurality of contact holes 181 exposing the end portions 129of the gate lines 121. A plurality of ohmic contacts 81 are formed onthe passivation layer 180 and they contact the end portions 129 of thegate lines 121 through the contact holes 81.

In addition, the TFT array panel according to this embodiment provides aplurality of color filters 230 under the passivation layer 180. As shownin FIG. 17, each of the color filters 230 are disposed substantially onthe pixel electrodes 190, and the color filters 230 in a column may beconnected to form a strip. The color filters 230 have a plurality ofopenings 233 c, 235 a and 235 b exposing the third source electrodes 183c, the first drain electrodes 175 a, and the second drain electrodes 175b, respectively, and surrounding the contact holes 183 c, 185 a and 185b, respectively. The color filters 230 are not disposed on a peripheralarea that is provided with the expanded end portions 129 of the gatelines 121 and the expanded end portions 179 of the data lines 171.Although FIG. 15 shows that edges of adjacent color filters 230 exactlymatch each other, the color filters 230 may overlap each other on thedata lines 171 to enhance the light blocking. Alternatively, they may bespaced apart from each other. When the color filters 230 overlap eachother, a light blocking film on a common electrode panel may be omitted.

A manufacturing method of the TFT array panel according to an embodimentsimultaneously forms the data lines 171, the source electrodes 173 a and173 c, the drain electrodes 175 a-175 c, the semiconductors 151, and theohmic contacts 161, 163 c, and 165 a-165 c using one photolithographyprocess.

A photoresist pattern for the photolithography process hasposition-dependent thickness, and in particular, it has first and secondportions with decreased thickness. The first portions are located onwire areas that will be occupied by the data lines 171, the sourceelectrodes 173 a and 173 c, and the drain electrodes 175 a-175 c; andthe second portions are located on channel areas of the TFTs Q1-Q3.

The position-dependent thickness of the photoresist is obtained byseveral techniques, for example, by providing translucent areas, as wellas transparent areas, and light-blocking opaque areas on the exposuremask. The translucent areas may have a slit pattern, a lattice pattern,a thin film(s) with intermediate transmittance or intermediatethickness. When using a slit pattern, it is preferable that the width ofthe slits or the distance between the slits is smaller than theresolution of a light exposer used for the photolithography. In anotherembodiment, a reflowable resist may be used. For example, a photoresistpattern made of a reflowable material is formed using a normal exposuremask having only transparent areas and opaque areas. Thereafter, thereflowable material is subjected to a reflow process so that thematerial flows onto areas without the photoresist, thereby forming thinportions.

Using the embodiments of illustrative photoresists described aboveimproves manufacturing methods by omitting a photolithography step.

Many of the above-described features of the LCD shown in FIGS. 1-5 maybe included in the LCD shown in FIGS. 13-15.

A LCD according to another embodiment of the present invention will bedescribed in detail with reference to FIGS. 16-21. FIG. 16 is a top viewof a TFT array panel for a LCD according to another embodiment of thepresent invention. FIG. 17 is a top view of a common electrode panel fora LCD according to another embodiment of the present invention. FIG. 18is a top view of a LCD including the TFT array panel shown in FIG. 16and the common electrode panel shown in FIG. 17. FIGS. 19-21 aresectional views of the LCD shown in FIG. 18 taken along the linesXIX-XIX′, XX-XX′, and XXI-XXI′, respectively.

Referring to FIGS. 16-21, a LCD according to this embodiment alsoincludes a TFT array panel 100, a common electrode panel 200, and a LClayer 3 interposed therebetween.

Layered structures of the panels 100 and 200 according to thisembodiment are almost the same as those shown in FIGS. 1-5, and thus arenot described again in detail, in order not to unnecessarily complicatethe invention. However, a layout of the LCD according to this embodimentdiffers from the LCD shown in FIGS. 1-5.

For example, as shown, each data line 171 includes a plurality of pairsof oblique portions and a plurality of longitudinal portions such thatit curves periodically. A pair of oblique portions are connected to eachother to form a chevron and opposite ends of the pair of obliqueportions are connected to respective longitudinal portions. The obliqueportions of the data lines 171 make an angle of about 45 degrees withthe gate lines 121, and the longitudinal portions cross over the gatelines 121 and include the first and the second source electrodes 173 aand 173 c projected toward the first and the second gate electrodes 124a and 124 c. The length of a pair of oblique portions is about one tonine times the length of a longitudinal portion. In other words, alength of the longitudinal portion is about 50-90 percent of the totallength of the pair of oblique portions. The number and the shape of theoblique portions connected between adjacent longitudinal portions may bevariously modified.

Each pair of first and second pixel electrodes 190 a and 190 b may belocated substantially in an area enclosed by the data lines 171 and thegate lines 121. The pixel electrodes also form a chevron having aplurality of outer edges including two pairs of oblique edges, two pairsof longitudinal edges, and a pair of transverse upper and lower edges.

In one embodiment, the second pixel electrode 190 b is almost enclosedby the first pixel electrode 190 a and is substantially equidistant fromthe opposite oblique outer edges of the above-described chevron. Thesecond pixel electrodes 190 b may have a shape of a narrow chevron thathas (i) two pairs of oblique edges substantially parallel to the obliqueportions of the data lines 171, (ii) a pair of longitudinal edgesconnected to one of the two pairs of oblique edges and substantiallyparallel to the longitudinal portions of the data lines 171, (iii) anoblique upper edge connected to the other of the two pairs of obliqueedges and substantially perpendicular to the other pair of obliqueedges, and (iv) a transverse lower edge connected to the pair oflongitudinal edges and forming an outer boundary of the pair of firstand second pixel electrodes 190 a and 190 b.

The first pixel electrode 190 a may have a plurality of inner edgesfacing the oblique edges and the longitudinal edges of the second pixelelectrode 190 b.

Accordingly, a gap 195 between the first and the second pixel electrodes190 a and 190 b may have a shape following the shape of the inner edgesof the first and the second pixel electrodes 190 a and 190 b. In oneembodiment, the gap 195 has a width preferably equal to about 2-5microns.

Additionally, the oblique edges of the first and the second pixelelectrodes disposed near the first drain electrodes 175 a may beslightly curved along edges of the first drain electrodes 175 a. Theshape of the expansions of the second source electrodes 173 b and thefirst and the second drain electrodes 175 a and 175 b may have a varietyof modifications such as diamond and parallelogram. In particular, theexpansions may have oblique edges parallel to the oblique portions ofthe data lines 171 and the oblique edges of the first and the secondpixel electrodes 190 a and 190 b. For example, FIG. 16 shows that eachof the second source electrodes 173 c may include a rectangularexpansion having a chamfered corner. FIG. 16 further shows that eachcoupling electrode 176 may have a pair of oblique edges parallel to anedge of the pixel electrodes 190 a and 190 b adjacent thereto andanother oblique edge connected to the pair of oblique edges andperpendicular thereto.

The contact holes 182, 183 c, 185 a and 185 b can have various shapessuch as polygon or circle. The sidewalls of the contact holes 182, 183c, 185 a and 185 b may be inclined with an angle of about 30-80 degrees,or have stepwise profiles. Each contact hole 182 has an area preferablyequal to or larger than about 0.5 mm.times.about 15 .mu.m and not largerthan about 2 mm.times.about 60 .mu.m.

Although the TFT array panel shown in FIGS. 16-21 includes no storageelectrode line, it may also include a plurality of storage electrodelines including storage electrodes having a various shape, whichapproximates the shape of the pixel electrodes 190 a and 190 b and thedata lines 171.

In one embodiment, the common electrode 270 has a plurality ofchevron-like cutouts 275. Each cutout 275 includes a pair of obliqueportions connected to each other, a transverse portion connected to oneof the oblique portions, and a longitudinal portion connected to theother of the oblique portions. The oblique portions of the cutout 275may extend substantially parallel to the oblique portions of the datalines 171 and face a second pixel electrode 190 b so that they maybisect each of the first and the second pixel electrodes 190 a and 190 binto substantially identical left and right halves. Each of the obliqueportions of the cutout 275 may include a transverse branch (not shown)bisecting each of the left and the right halves into lower and upperquarters. The transverse and the longitudinal portions of the cutout 275are aligned with transverse and longitudinal edges of the pixelelectrode 190, respectively, and they may make obtuse angles with theoblique portions of the cutout 190. The cutouts 275 preferably have awidth in a range about 9-12 microns, and may be substituted withprotrusions preferably made of organic material and preferably having awidth ranging about 5 microns to about 10 microns.

The light blocking member 220 may include a plurality of linear portionsfacing the gate lines 121 and the data lines 171. It may further includea plurality of rectangular portions facing the TFTs such that the lightblocking member 220 prevents light leakage between the pixel electrodes190 and defines open areas facing the pixel electrodes 190.

The color filters 230 may be disposed substantially in the open areasdefined by the light blocking member 220 and thus they may also have achevron-like shape. Additionally, the color filters 230 disposed in twoadjacent data lines 171 arranged in the longitudinal direction may beconnected to each other to form a strip.

In use, when a common voltage is applied to the common electrode 270 anda data voltage is applied to the pixel electrodes 190 a and 190 b of theLCD, a primary electric field is generated that is substantiallyperpendicular to the surfaces of the panels 100 and 200. The LCmolecules respond to the electric field by changing their orientations,such that their long axes become positioned perpendicular to thedirection of the electric field. In the meantime, the cutouts 275 of thecommon electrode 270 and the outer edges of the pixel electrodes 190 aand 190 b distort the primary electric field to have a horizontalcomponent which determines the tilt directions of the LC molecules. Thehorizontal component of the primary electric field is perpendicular tothe edges of the cutouts 275 and the outer edges of the pixel electrodes190 a and 190 b.

Accordingly, four sub-regions having different tilt directions areformed in a pixel region of the LC layer 3, in which the pixelelectrodes 190 a and 190 b are located. Illustratively, the foursub-regions are partitioned by (i) outer edges of a pair of pixelelectrodes 190 a and 190 b, (ii) a cutout 275 bisecting the pixelelectrodes 190 a and 190 b, and (iii) an imaginary transverse centerline passing through the meeting point of the oblique portions of thecutout 275. In one embodiment, each sub-region has two major edgesdefined by the cutout 275 and an oblique outer edge of the pixelelectrodes 190 a and 190 b, respectively. The sub-regions are classifiedinto a plurality of domains based on the tilt directions. In oneembodiment, four domains are preferably used.

Because the voltage of the second pixel electrode 190 b is higher thanthat of the first pixel electrode 190 a, a horizontal component isgenerated in the electric field near the gap 195. In one embodiment,this horizontal component points the same direction as a horizontalcomponent of the electric field near an adjacent outer edge of the firstpixel electrode 190 a. Accordingly, the horizontal component near thegap 195 enhances determination of the tilt directions of the LCmolecules in the sub-region and reduces response time without generatinglight leakage near the gaps 275. In one embodiment, gap 195 also reducesthe aperture ratio. Depending its geometry, gap 195 may generate ahorizontal component of the electric field, which is parallel orantiparallel to the tilt directions of the LC molecules in thesubregion.

In one embodiment, the direction of a secondary electric field due tothe voltage difference between adjacent first pixel electrodes 190 a maybe perpendicular to the edges of the cutouts 275. If so, the directionof the secondary electric field will coincide with the direction of thehorizontal component of the primary electric field. Consequently, thesecondary electric field formed between the first pixel electrodes 190 ashould enhance determination of the tilt directions of the LC molecules.

FIG. 21 shows resultant equipotential lines depicted in dotted lines,which are obtained by simulation.

Since the LCD performs inversion such as dot inversion, columninversion, etc., adjacent pixel electrodes are supplied with datavoltages having opposite polarity with respect to the common voltage.Consequently, a secondary electric field between the adjacent pixelelectrodes is almost always generated to enhance the stability of thedomains.

Since the tilt directions of all domains make an angle of about 45degrees with the gate lines 121, which are parallel to or perpendicularto the edges of the panels 100 and 200, and the 45-degree intersectionof the tilt directions and the transmissive axes of the polarizers givesmaximum transmittance, the polarizers can be attached such that thetransmissive axes of the polarizers are parallel to or perpendicular tothe edges of the panels 100 and 200. This reduces production costs.

The LCD shown in FIGS. 16-21 can have several modifications.

For example, the pixel electrodes 190 as well as the common electrode270 may have cutouts (not shown) for generating fringe field.Furthermore, the cutouts may be substituted with protrusions disposed onthe common electrode 270 or the pixel electrodes 190 a and 190 b.

The shapes and the arrangements of the cutouts or the protrusions may bevaried depending on the design factors such as the size of pixels, theratio of the width and the length of the pixel electrodes 190 a and 190b, the type and characteristics of the liquid crystal layer 3, and soon.

Many of the above-described features of the LCD shown in FIGS. 1-5 maybe made to the LCD shown in FIGS. 16-21.

A TFT array panel for a LCD according to another embodiment of thepresent invention will be described in detail with reference to FIGS.22-24.

FIG. 22 is a top view of a TFT array panel for a LCD according toanother embodiment of the present invention, and FIGS. 23 and 24 aresectional views of the TFT array panel shown in FIG. 22 taken along thelines XXIII-XXIII′ and XXIV-XXIV′, respectively.

A layered structure and a layout of the TFT array panel according tothis embodiment is almost the same as those shown in FIGS. 16-21.

As illustratively shown, a plurality of gate lines 121 that include aplurality of first gate electrodes 124 a and second gate electrodes 124c are formed on a substrate 110. A gate insulating layer 140, aplurality of semiconductor strips 151 that include a plurality ofprojections 154 a and 154 c is also formed on the substrate. Thereafter,a plurality of ohmic contact strips 161 including a plurality ofprojections 163 a, and a plurality of ohmic contact islands 163 c, and165 a-165 c are formed on the substrate. As previously described, aplurality of data lines 171 (including a plurality of first sourceelectrodes 173 a), a plurality of second source electrodes 173 c, and aplurality of first to third drain electrodes 175 a-175 c (includingcoupling electrodes 176) are formed on the ohmic contacts 161, 163 c and165 a-165 c, respectively. Additionally, a passivation layer 180 may beformed over the data lines. A plurality of contact holes 182, 183 c, 185a and 185 b may be provided at the passivation layer 180 and the gateinsulating layer 140. Additionally, a plurality of pairs of pixelelectrodes 190 a and 190 b separated by a gap 195, and a plurality ofcontact assistants 82 may be formed on the passivation layer 180.

Different from the TFT array panel shown in FIGS. 16-21, thesemiconductor strips 151 have almost the same planar shapes as the datalines 171, the source electrodes 173 a and 173 c, and the drainelectrodes 175 a-175 c as well as the underlying ohmic contacts 161, 163c and 165 a-165 c. However, the projections 154 a and 154 c of thesemiconductor strips 151 include some exposed portions, which are notcovered with the data lines 171, etc., such as portions located betweenthe source electrodes 173 a and 173 c and the drain electrodes 175 a-175c.

Furthermore, each gate line 121 has an expanded end portion 129 having alarge area for contact with another layer or an external device, and thegate insulating layer 140 and the passivation layer 180 have a pluralityof contact holes 181 exposing the end portions 129 of the gate lines121. A plurality of ohmic contacts 81 formed on the passivation layer180 contact the end portions 129 of the gate lines 121 through thecontact holes 81.

In addition, the TFT array panel according to this embodiment provides aplurality of color filters 230 under the passivation layer 180. Each ofthe color filters 230 are disposed substantially on the pixel electrodes190. Additionally, the color filters 230 in a column may be connected toform a strip. The color filters 230 may have a plurality of openings 233c, 235 a and 235 b exposing the third source electrodes 183 c, the firstdrain electrodes 175 a, and the second drain electrodes 175 b,respectively, and surrounding the contact holes 183 c, 185 a and 185 b,respectively. In one embodiment, the color filters 230 are not disposedon a peripheral area that is provided with the expanded end portions 129and 179 of the gate lines 121 and the data lines 171. Although FIG. 23shows that edges of adjacent color filters 230 exactly match each other,the color filters 230 may overlap each other on the data lines 171 toenhance the light blocking. Alternatively, they may be spaced apart fromeach other. When the color filters 230 overlap each other, a lightblocking film on a common electrode panel may be omitted.

A manufacturing method of the TFT array panel according to an embodimentsimultaneously forms the data lines 171, the source electrodes 173 a and173 c, the drain electrodes 175 a-175 c, the semiconductors 151, and theohmic contacts 161, 163 c and 165 a-165 c using one photolithographyprocess.

For example, a photoresist pattern for the photolithography process hasposition-dependent thickness. In one embodiment, the photoresist patternhas first and second portions with decreased thickness. The firstportions may be located on wire areas that will be occupied by the datalines 171, the source electrodes 173 a and 173 c, and the drainelectrodes 175 a-175 c. The second portions may be located on channelareas of TFTs Q1-Q3.

As a result, the manufacturing process is simplified by omitting aphotolithography step.

Many of the above-described features of the LCD shown in FIGS. 16-21 maybe included in the LCD shown in FIGS. 22-24.

While the present invention has been described in detail with referenceto the preferred embodiments, those skilled in the art will appreciatethat various modifications and substitutions can be made thereto withoutdeparting from the spirit and scope of the present invention as setforth in the appended claims.

What is claimed is:
 1. A flat panel display, comprising: a substrate; agate line disposed on the substrate; a signal line extendedsubstantially parallel to the gate line; a data line intersecting thegate line; a first sub pixel electrode and a second sub pixel electrodedisposed on the substrate; a first thin film transistor electricallyconnected to the gate line and the first sub pixel electrode; a secondthin film transistor electrically connected to the gate line and thesecond sub pixel electrode; and a third thin film transistorelectrically connected to the signal line and the first sub pixelelectrode.
 2. The flat panel display of claim 1, further comprising: astorage electrode pattern disposed on a same layer as the gate line, anda coupling electrode electrically connected to the third thin filmtransistor and overlapping a portion of the storage electrode pattern.3. The flat panel display of claim 2, wherein a capacitance between thecoupling electrode and the storage electrode pattern is different from acapacitance between the first pixel electrode and the storage electrodepattern.
 4. The flat panel display of claim 3, wherein the capacitancebetween the coupling electrode and the storage electrode pattern rangesfrom about 1/10 to about ⅓ of the capacitance between the first pixelelectrode and the storage electrode pattern.
 5. The flat panel displayof claim 2, wherein a first terminal of the first thin film transistoris connected to the gate line, a second terminal of the first thin filmtransistor is connected to the data line, and a third terminal of thefirst thin film transistor is connected to the first sub pixelelectrode, wherein a first terminal of the second thin film transistoris connected to the gate line, a second terminal of the second thin filmtransistor is connected to the data line, and a third terminal of thesecond thin film transistor is connected to the second sub pixelelectrode, and wherein a first terminal of the third thin filmtransistor is connected to the signal line, a second terminal of thethird thin film transistor is connected to the first sub pixelelectrode, and a third terminal of the third thin film transistor isconnected to the coupling electrode.
 6. The flat panel display of claim2, wherein a first voltage supplied to the first sub pixel electrode ischanged to a second voltage different from the first voltage throughactivation of the third thin film transistor, wherein a ratio of thefirst voltage of the first sub pixel electrode to the second voltage ofthe first sub pixel electrode is in a range from about 1:0.89 to about1:1.
 7. The flat panel display of claim 6, wherein a ratio of the areaof the first sub pixel electrode to the area of the second sub pixelelectrode is in a range from about 50:50 to about 80:20.
 8. The flatpanel display of claim 7, wherein the first sub pixel electrode has adomain divider.
 9. The flat panel display of claim 8, wherein aparasitic capacitance between the signal line and a third terminal ofthe third thin film transistor is larger than a parasitic capacitancebetween the gate line and a third terminal of the first thin filmtransistor.
 10. The flat panel display of claim 9, wherein the signalline is another gate line adjacent to the gate line.
 11. The flat paneldisplay of claim 1, wherein a first voltage supplied to the first subpixel electrode is changed to a second voltage different from the firstvoltage through activation of the third thin film transistor, wherein aratio of the first voltage of the first sub pixel electrode to thesecond voltage of the first sub pixel electrode is in a range from about1:0.89 to about 1:1.
 12. The flat panel display of claim 11, wherein aratio of the area of the first sub pixel electrode to the area of thesecond sub pixel electrode is in a range from about 50:50 to about80:20.
 13. The flat panel display of claim 12, wherein the first subpixel electrode has a domain divider.
 14. The flat panel display ofclaim 13, wherein a parasitic capacitance between the signal line and athird terminal of the third thin film transistor is larger than aparasitic capacitance between the gate line and a third terminal of thefirst thin film transistor.
 15. The flat panel display of claim 14,wherein the signal line is another gate line adjacent to the gate line.16. The flat panel display of claim 1, wherein a ratio of the area ofthe first sub pixel electrode to the area of the second sub pixelelectrode is in a range from about 50:50 to about 80:20.
 17. The flatpanel display of claim 16, wherein the first sub pixel electrode has adomain divider.
 18. The flat panel display of claim 17, wherein aparasitic capacitance between the signal line and a third terminal ofthe third thin film transistor is larger than a parasitic capacitancebetween the gate line and a third terminal of the first thin filmtransistor.
 19. The flat panel display of claim 18, wherein the signalline is another gate line adjacent to the gate line.
 20. The flat paneldisplay of claim 1, wherein the first sub pixel electrode has a domaindivider.